Objective
This course covers principles and practice of state-of-the-art nanofabrication technology. These nanofabrication techniques are the foundation to build integrated devices and circuits with feature size below 100 nm and are widely employed in various areas such as nanoelectronics, nanophotonics, nanomechanics, and microfluidics. Students will learn to use the fabrication and characterization equipment available in the public cleanroom of the faculty of engineering. The top-down nanofabrication processes, such as lithography, etching, and thin-film deposition, etc. will be addressed.
Syllabus
This course covers principles and practice of state-of-the-art nanofabrication technology. These nanofabrication techniques are the foundation to build integrated devices and circuits with feature size below 100 nm and are widely employed in various areas such as nanoelectronics, nanophotonics, nanomechanics, and microfluidics. Students will learn to use the fabrication and characterization equipment available in the public cleanroom of the faculty of engineering. The top-down nanofabrication processes, such as lithography, etching, and thin-film deposition, etc. will be addressed.
Learning Outcome
By the end of the course, students should be able to: - understand the fundamental principles of nanofabrication approaches - design the fabrication process according to the nanodevices’ applications – photonics, electronics, or MEMS/NEMS - operate equipment to complete major top-down fabrication steps, such as lithography, etching, and thin-film deposition
